Method of making a reusable photolithography mask

Details Method of making a reusable photolithography mask Method of making a reusable photolithography mask

1998-02-06

1999-08-31

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 500, G03F 900

Patent

active

059452382

ABSTRACT:
A method is provided for making re-usable configuration masks by initially patterning a mask blank using precision mask-making tools. The mask is then covered with an opaque material, and desired configuration points for a particular ASIC are selected with a non-precision laser. After the particular configuration pattern is no longer needed, the remaining opaque material is removed. The mask can then be re-configured for a new design by covering the mask with a new layer of opaque material and selecting new configuration points. Such a mask reduces both time and costs for creating a set of mask designs because a single mask can be re-used for several different designs without the further need of precision mask-making tools.

REFERENCES:
patent: 4475811 (1984-10-01), Brunner
patent: 5552249 (1996-09-01), Jensen et al.

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