Method of making a planar electrode

Details Method of making a planar electrode Method of making a planar electrode

2010-02-25

2010-11-16

Arbes, C. J (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S830000, C029S832000, C029S846000, C029S852000

Reexamination Certificate

active

07832090

ABSTRACT:
Chemical mechanical polishing (CMP) of thin film materials using a slurry including a surfactant chemical operative to polish high portions of the film being planarized while preventing the polishing of low portions of the film is disclosed. The low portions can be in a step reduction region of a deposited film. The CMP process can be used for form a planar surface upon which subsequent thin-film layers can be deposited, such as an electrically conductive material for an electrode. The subsequently deposited thin-film layers are substantially planar as deposited without having to use CMP. The resulting thin-film layers are planar and have a uniform cross-sectional thickness that can be beneficial for layers of memory material for a memory cell. The processing can be performed back-end-of-the-line (BEOL) on a previously front-end-of-the-line (FEOL) processed substrate (e.g., silicon wafer) and the BEOL process can be used to fabricate two-terminal non-volatile cross-point memory arrays.

REFERENCES:
patent: 6034882 (2000-03-01), Johnson et al.
patent: 6062952 (2000-05-01), Robinson et al.
patent: 6858531 (2005-02-01), Zhu et al.
patent: 6903361 (2005-06-01), Gilton
patent: 6930909 (2005-08-01), Moore et al.
patent: 6972238 (2005-12-01), Hsu et al.
patent: 7030019 (2006-04-01), Kawasaki
patent: 7148533 (2006-12-01), Hsu et al.
patent: 7285145 (2007-10-01), Zhu et al.
patent: 7316976 (2008-01-01), Nojo et al.
patent: 7335906 (2008-02-01), Toda
patent: 7459716 (2008-12-01), Toda et al.
patent: 7460385 (2008-12-01), Gruber et al.
patent: 7569459 (2009-08-01), Karg et al.
patent: 7577022 (2009-08-01), Muraoka et al.
patent: 2003/0015740 (2003-01-01), Li et al.
patent: 2003/0151959 (2003-08-01), Tringali et al.
patent: 2007/0176264 (2007-08-01), Lee et al.
patent: 2008/0173975 (2008-07-01), Chen et al.
patent: 2008/0254617 (2008-10-01), Adetutu et al.
patent: 2009/0047787 (2009-02-01), Li et al.

Affiliated with

Also associated with

Rating

Method of making a planar electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making a planar electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a planar electrode will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4232985