Method of making a packaged radiation sensitive resist...

Package making – Methods – With adsorption or absorption of contents

Reexamination Certificate

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C053S449000, C053S469000

Reexamination Certificate

active

10295595

ABSTRACT:
The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitivity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.

REFERENCES:
patent: 1835118 (1931-12-01), Marden et al.
patent: 3108359 (1963-10-01), Moore et al.
patent: 3391517 (1968-07-01), Lentz
patent: 3423817 (1969-01-01), Bobo
patent: 3627521 (1971-12-01), Vordahl
patent: 4014346 (1977-03-01), Brownlee et al.
patent: 4630095 (1986-12-01), Otsuka et al.
patent: 4680248 (1987-07-01), Roach
patent: 5091233 (1992-02-01), Kirby et al.
patent: 5228567 (1993-07-01), Itoh
patent: 5304419 (1994-04-01), Shores
patent: 5551557 (1996-09-01), Brooks et al.
patent: 5694740 (1997-12-01), Martin et al.
patent: 5724748 (1998-03-01), Brooks et al.
patent: 5811184 (1998-09-01), Anderson et al.
patent: 5875897 (1999-03-01), Duncan et al.
patent: 5911336 (1999-06-01), Porta et al.
patent: 5965978 (1999-10-01), Kishino et al.
patent: 6003674 (1999-12-01), Brooks
patent: 6026963 (2000-02-01), Gray et al.
patent: 6037097 (2000-03-01), Bucchignano et al.
patent: 6043003 (2000-03-01), Bucchignano et al.
patent: 6074459 (2000-06-01), Gingrich et al.
patent: 6114273 (2000-09-01), Hayden
patent: 6117405 (2000-09-01), Frey et al.
patent: 6120860 (2000-09-01), Bowen et al.
patent: 6120983 (2000-09-01), Okada et al.
patent: 6203869 (2001-03-01), Dougherty et al.
patent: 6257402 (2001-07-01), Hedman
patent: 6428612 (2002-08-01), McPhilmy et al.
patent: 6436505 (2002-08-01), Kuroda et al.
patent: 2002/0172143 (2002-11-01), Lawandy et al.
patent: 0932082 (1999-07-01), None
“Contamination Control During Shipping, Handling and Storage of Reticles,” Sheng-Bai Zhu, In Metrology, Inspection, and Process Control for Microlothography XIV, SPIE, vol. 3998 (2000), pp. 565-572.
“Effect of Overcoats on Environmental Stability of a Chemically Amplified Positive Resist Against Water and Organic Bases,” Nakamura et al., Journal of Photopolymer Science and Technology, vol. 8, No. 4 (1995), pp. 555-560.
“Performance of Positive Tone Chemically Amplified Resists For Next Generation Photomask Fabrication,” Segawa et al., SPIE vol. 3236, pp. 82-92, date unknown.
“Investigation of Deep UV Resist by NMR: Residual Casting Solvents, Chemistries, and PAG Decomposition in Film,” Ito et al., Journal of Photopolymer Science and Technology, vol. 12, No. 4 (1999), pp. 625-636.
“Influence of Organic contamination on Resist Profiles,” Czech et al., Microelectronic Engineering 23 (1994) pp. 331-335.
“Influence of Polymer Properties on Airborne Chemical Contamination of Chemically Amplified Resists,” Hinsberg et al., SPIE, vol. 1925, pp. 43-51.
“Effect of Gaseous Permeability of Overcoat Layer on KrF Chemically Amplified Positive Resists,” Kishimura et al., J. Vac. Sci. Technol. B 14(6), Nov./Dec. 1996, pp. 4234-4238.
“Development of Ammonia Adsorption Filter and its Application to LSI Manufacturing Environment,” Saiki et al., Journal of Photopolymer Science and Technology, vol. 8, No. 4 (1995) pp. 599-606.
(Abstract Only) “Acid Rain reduced in Eastern United States,” Lynch et al. Environment Science and Technology, vol. 34, No. 6, 2000, pp. 940-949.
(Abstract Only) “Outdoor Air Concentrations of Nitrogen Dioxide and Sulfur Dioxide and Prevalence of Wheezing in School Children,” Epidemiology vol. 11, No. 2, Mar. 2000, pp. 153-160, 153-160.
(Abstract only) “On the Origin of SO2 above Northern Greece,” Zerofos et al., Geophysical Research Letters, vol. 27, No. 3, 2000, pp. 365-368.
(Abstract Only) “Environmental Risk Factors (Outdoor Air Pollution and Climatic Changes and Increased Trend of Respiratory Allergy,” D'Amato et al., Journal of Investigational Allergology and Clinical Immunology, vol. 10, No. 3, May-Jun. 2000, pp. 123-128.
“A CA Resist with High Sensitivity and Sub 100nm Resolution for Advanced Mask Making,” Huang et al., Photomask and Next Generation Lithography Mask, VII, Proceedings of SPIE vol. 4066 (2000).
PCT International Search Report, Sep. 23, 2002.
XP008008246, Saiki et al., “Development of Ammonia Adsorption Filter and its Application to LSI Manufacturing Environment”, Journal of Photopolymer Science and Technology, vol. 8, No. 4, 599-606, 1995.
XP-002214294, “Oxygen Absorb food Package Long Storage Preparation Mix Magnesium Hydroxide Hydrosulphite Silica Gel”.

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