Method of making a negative photoresist image

Details Method of making a negative photoresist image Method of making a negative photoresist image

1976-05-03

1978-08-01

Bowers, Jr., Charles L.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 362, 96 49, 96 91D, 427 43, G03C 500

Patent

active

041040708

ABSTRACT:
The invention relates to a method of making a negative photoresist image on a substrate, where a normally positive working photoresist material containing 1-hydroxyethyl-2-alkyl-imidazoline is applied to a substrate, image-wise exposed with actinic radiation, heated, and blanket exposed to actinic radiation. The material which was not exposed originally is then removed with a solvent to give a negative image.

REFERENCES:
patent: 3264104 (1966-08-01), Reichel
patent: 3406065 (1968-10-01), Uhlig
patent: 3759711 (1973-09-01), Rauner et al.
patent: 3827908 (1974-08-01), Johnson et al.
patent: 3873313 (1975-06-01), Horst et al.
patent: 3890152 (1975-06-01), Ruckert et al.
Dinaburg; M. S., "Photosensitive Diazo Cpds", The Focal Press, 1964, pp. 190-196.

Affiliated with

Also associated with

Rating

Method of making a negative photoresist image does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making a negative photoresist image, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a negative photoresist image will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1977703