Method of making a mushroom-shaped gate electrode of semiconduct

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437912, 437944, 148DIG100, H01L 21265

Patent

active

052886549

ABSTRACT:
A mushroom-shaped gate electrode has a lower end in a recess in a semiconductor active layer on a semiconductor substrate. The gate electrode has an enlarged head. A metallic side wall is disposed on a portion of the leg of the gate electrode adjacent the head. Thus, the gate length of a semiconductor device, such as a field effect transistor, is reduced while the effective cross-sectional area of the gate electrode is increased whereby the noise characteristics of the semiconductor device are improved.

REFERENCES:
patent: 4213840 (1980-07-01), Omori et al.
patent: 4808545 (1989-02-01), Balasubramanyam
patent: 4955805 (1990-06-01), Calviello et al.
patent: 5032541 (1991-07-01), Sakamoto et al.
patent: 5057883 (1991-10-01), Noda
patent: 5139968 (1992-08-01), Hayase et al.
Wang et al., "A 0.1 .mu.m Al.sub.0.5 In.sub.0.5 As/Ga.sub.0.5 As MODFET Fabricated GaAs Substrates", IEEE Transactions on Electron Devices, vol. 35, No. 7, Jul. 1988, pp. 818-823.
Jones et al., "Very Low-Noise HEMTs Using A 0.2 .mu.m T-Gate", Electronics Letters, vol. 23, No. 16, Jul. 1987, pp. 844-845.
Sakaue et al., "Self-Aligned Half-Micrometer Silicon MASFET's With Metallic Amorphous Silicon Gate", IEEE Transactions on Electron Devices, vol. Ed-33, No. 7, Jul. 1986, pp. 997-1004.
Weitzel et al., "A Review of GaAs MESFET Gate Electrode Fabrication Techologies", Journal of the Electrochemical Society, Oct. 1986, p. 409C-416C.
Mishra et al., "Novel High Performance Self-Aligned 0.15 Micron Long T-Gate AlInAs-GaInAs HEMTs", IEEE IEDM 89-101-104, pp. 5.2.1-5.3.4 (1989).
Nguyen et al., "Fabrication of a 80 nm Self-Aligned T-Gate AlInAs/GaInAs HEMT", IEEE IEDM 90-499-502, pp. 19.1.1-19.1.4, (1990).
Onda et al., "0.2 .mu.m T-Shaped Gate 2DEGFET's With An (InAs) (GaAs) Short Period Superlattice Channel on a GaAs Substrate", IEEE IEDM 90-503-506, pp. 19.2.1-19.24, (1990).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making a mushroom-shaped gate electrode of semiconduct does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making a mushroom-shaped gate electrode of semiconduct, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a mushroom-shaped gate electrode of semiconduct will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-170653

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.