Method of making a MESFET having same type conductivity for sour

Metal treatment – Compositions – Heat treating

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29571, 148187, 357 23, 357 91, H01L 2120, H01L 21306

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043257470

ABSTRACT:
A MESFET is disclosed wherein a gallium arsenide semiconductor material is doped. The doping magnitude differs in the source area, drain area, and in the gate area. An increase of the dielectric strength without an increase of parasitic resistances is provided. In the manufacture of the MESFET, shadowing techniques are employed to vary the doping magnitudes.

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patent: 4089712 (1978-05-01), Joy et al.
patent: 4111725 (1978-09-01), Cho et al.
patent: 4193182 (1980-03-01), Lee
patent: 4232439 (1980-11-01), Shibata
Fukuta et al. IEEE, vol. MTT-24, No. 6 (1976) pp. 312-317.
Wemple et al. in Inst. Phys. Conf. Series No. 33b, 1977, Chapt. 5, pp. 262-270.
Ohata et al. IEEE-Trans. Electron Device, ED-24 (1977) 1129-1130.
Hasegawa et al., IEEE Int'l. Solid State Circuits Conf. Digest Tech. Papers, (1978) pp. 118.

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