Method of making a memory cell

Semiconductor device manufacturing: process – Making passive device – Trench capacitor

Reexamination Certificate

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Details

C257S301000

Reexamination Certificate

active

07141482

ABSTRACT:
Methods of making memory devices/cells are disclosed. First and second electrode layers and a controllably conductive media therebetween are formed over a dielectric layer that has a planar surface and at least one opening. The layers on the dielectric layer planar surface are removed so that the remaining second electrode surface in the opening is co-planar with the dielectric layer planar surface. Methods of using the memory devices/cells, and devices such as computers containing the memory devices/cells are also disclosed.

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