Method of making a magnetic oxide film

Details Method of making a magnetic oxide film Method of making a magnetic oxide film

1975-10-14

1977-03-22

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

360135, C23C 1500, G11B 582

Patent

active

040135349

ABSTRACT:
In the process of sputtering of an iron target in an atmosphere composed of a mixed gas containing a rare gas and oxygen, the oxygen partial pressure is regulated prior to both presputtering and main sputtering, by which ferromagnetic oxide Fe.sub.3 O.sub.4 is deposited on a substrate in one process. By setting the temperature of the substrate at 150.degree. to 250.degree. C, the coercive force and the squareness ratio of the oxide film is greatly enhanced. By using the oxide film as a medium of a magnetic disk storage, a magnetic recording and storage device of excellent characteristics can be obtained.

REFERENCES:
patent: 3763003 (1973-10-01), Kobayashi et al.
patent: 3795542 (1974-03-01), Halaby et al.
patent: 3829372 (1974-08-01), Heller

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