Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2006-03-07
2006-03-07
Tugbang, A. Dexter (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603070, C029S603110, C029S603130, C029S603140, C029S603150, C029S603180, C204S192320, C204S192330, C204S192350, C216S062000, C216S063000, C216S066000, C360S324120, C360S327320, C451S004000, C451S051000, C427S127000, C427S128000
Reexamination Certificate
active
07007374
ABSTRACT:
A narrow track width read sensor having a high magnetoresistive sensitivity is made using a self-aligned process which requires the use of only a single resist mask. A plurality of sensor layers is deposited over a substrate. After forming a resist mask in the central region, first lead layers are deposited in the end regions and over the resist mask. Using the resist mask, ion milling is performed such that the first lead layers and sensor layers in the end regions are substantially removed but sensor layers in the central region remain, to thereby form a read sensor having lead overlays on the edges thereof. Hard bias and second lead layers are then deposited in the end regions and over the resist mask. After the resist mask is removed, the top of the read sensor may be oxidized through an exposure to oxygen plasma.
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“Submicron trackwidth and stripe height MR sensor test structures”; Fontana, R.E., Jr.; MacDonald, S.A.; Ching Tsang; Tsann Lin; Magnetics, IEEE Transactions on Vol. 32, Issue 5, Sep. 1996 Page(s):3440-3442.
Hitachi Global Storage Technologies - Netherlands B.V.
Kim Paul D.
Oskorep, Esq. John J.
Tugbang A. Dexter
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