Method of making a macroscopic stepped structure on a vicinally

Details Method of making a macroscopic stepped structure on a vicinally Method of making a macroscopic stepped structure on a vicinally

1989-06-02

1991-01-22

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

148DIG95, 148 332, 156610, 437 90, 437129, 437133, 437946, H01L 2120

Patent

active

049870947

ABSTRACT:
A semiconductor structure having a face with macroscopic parallel steps and its method of making. The structure is formed by cutting a face on a crystal at a vicinal angle, that is, being misoriented from a major crystal face by a few degrees. Atomic sized microsteps are formed in the vicinal face. Parallel grooves or other regular irregularities are etched in the vicinal face. Subsequent epitaxial growth causes the microsteps to coalesce into macroscopic steps. Alternatively, etching or annealing can accomplish the same coalescing. Novel electronic structures can be fabricated on the stepped structure.

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