Coating processes – Electrical product produced – Metallic compound coating
Patent
1975-10-20
1977-03-01
Skapars, Anthony
Coating processes
Electrical product produced
Metallic compound coating
204192, 427101, 427109, 427248B, B05D 512, C23C 1500
Patent
active
040102912
ABSTRACT:
A low resistance indium oxide conductive film is made on a substrate in an atmosphere for vacuum evaporation or sputtering where aqueous vapor or gas mixed with the vapor is introduced or wherein aqueous vapor is generated, by reactive vacuum evaporation or sputtering in said atmosphere using indium oxide or metallic indium as starting material.
REFERENCES:
patent: 3506556 (1970-04-01), Gillery et al.
patent: 3655545 (1972-04-01), Gillery et al.
patent: 3749658 (1973-07-01), Vossen, Jr.
patent: 3764280 (1973-10-01), Lupinski
patent: 3874922 (1975-04-01), Mickelson
patent: 3907660 (1975-09-01), Gillery
J. L. Vossen, "RF Sputtered Transparent Conductors - The System In.sub.2 O.sub.3 -SnO.sub.2," RCA Review, vol. 32, June 1971, pp. 289-296.
J. C. C. Fan et al., "Properties of Sn-Doped In.sub.2 O.sub.3 3 Films Prepared by RF Sputtering," J. Electrochem Soc., vol. 122, pp. 1719-1725 (1975).
D. B. Fraser et al., "Highly Conductive, Transparent Films of Sputtered In.sub.2.sub.-x Sn.sub.x O.sub.3.sub.-4," J. Electrochem Soc., vol. 119, pp. 1368-1374 (1972).
Katsube Shizuko
Katsube Yoshiyuki
Agency of Industrial Science & Technology
Skapars Anthony
Weisstuch Aaron
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