Method of making a high surface area electrode

Coating processes – Electrical product produced – Metallic compound coating

Reexamination Certificate

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Details

C427S079000, C427S115000, C427S123000, C427S197000, C427S282000, C427S383100

Reexamination Certificate

active

06899919

ABSTRACT:
A high surface area electrode is made by retaining an electrode blank with one surface thereof horizontal and facing upward. The surface is then submerged in a liquid having particles of conductive material suspended therein. The particles in suspension are then allowed to precipitate out and onto the surface of the electrode. This process is repeated until a porous layer of particles of the desired thickness has formed on the surface. As a final step the particles are bonded to the surface using an appropriate bonding method such as a heat treatment.

REFERENCES:
patent: 3403303 (1968-09-01), Klein
patent: 3465426 (1969-09-01), Baier
patent: 3765938 (1973-10-01), Cranston
patent: 4794018 (1988-12-01), Scheetz
patent: 4938994 (1990-07-01), Choinski
patent: 5817374 (1998-10-01), Detig
patent: 5963417 (1999-10-01), Anderson et al.
patent: 6033967 (2000-03-01), Li
patent: 6224985 (2001-05-01), Shah et al.
patent: 6340090 (2002-01-01), Jahani
patent: 6356432 (2002-03-01), Danel
patent: 6361824 (2002-03-01), Yekimov
patent: 6428842 (2002-08-01), Chiavarotti et al.
patent: 401248619 (1989-10-01), None
patent: 404065813 (1992-03-01), None

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