Method of making a high reflectivity micro mirror and a...

Optical: systems and elements – Lens – With support

Reexamination Certificate

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C359S822000, C359S813000

Reexamination Certificate

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07016128

ABSTRACT:
A method of making a high reflectivity micro mirror. A first step involves providing a monolithic bulk crystal silicon having an anisotropic body with a crystalline plane. A second step involves applying chemical agents to selectively remove a portion of the body overlying the crystalline plane to expose a portion of the crystalline plane. Crystalline planes that are present in monolithic bulk crystal silicon have an inherent smoothness which is on an atomic level. The underlying teaching of the present invention is that, instead of attempting to polish or otherwise smooth the surface of the silicon, one should merely expose all or a selected portion of the crystalline plane and use the exposed portion of the crystalline plane as a mirror surface.

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Madou, Marc, “Fundamentals of Microfabrication”, CRC Press, Washington, DC., 1997, pp. 148-154.

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