Glass manufacturing – Processes – With pore forming in situ
Patent
1977-10-17
1980-03-11
Kellogg, Arthur D.
Glass manufacturing
Processes
With pore forming in situ
106 40V, 106 41, C03B 1908
Patent
active
041926641
ABSTRACT:
An intimate mixture of an amorphous silica potassium oxide, boric oxide, alumina and a cellulating agent is subjected to a temperature of between 1390.degree. C. to 1450.degree. C. for a sufficient time to coalesce the mixture and gasify the cellulating agent and form a cellular body. The mixture is prepared by first forming a slurry and, drying the slurry to form aggregates, and are thereafter comminuted if necessary to form a pulverulent batch. The pulverulent batch is heated in a cellulating furnace to a foam-like mass which is comminuted to form a precellulated material. The precellulated material is mixed with additional cellulating agent and pulverulent batch in preselected proportions and heated in a furnace to gasify the cellulating agent to form a cellular body. Alternatively alumina, boric oxide, an alkali metal salt and a cellulating agent are comminuted and mixed in a ball mill. Thereafter, amorphous silica is added to form a mixture containing more than 80% silica. The mixture is milled in the ball mill and subjected to a temperature only sufficient to coalesce the mixture and gasify the cellulating agent to form a cellular body.
REFERENCES:
patent: 2582852 (1948-06-01), Shoemaker
patent: 3362805 (1968-01-01), Schulz
patent: 3874861 (1975-04-01), Kurz
Adams John M.
Kellogg Arthur D.
Pittsburgh Corning Corporation
Price, Jr,. Stanley J.
LandOfFree
Method of making a cellular body from a high silica borosilicate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of making a cellular body from a high silica borosilicate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a cellular body from a high silica borosilicate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1999368