Method of locating work in automatic exposing apparatus

Optics: measuring and testing – By alignment in lateral direction – With light detector

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355 53, 29593, G01B 1100

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active

053900251

ABSTRACT:
A work locating method for an automatic exposing apparatus is provided. In addition to a step of delivering a work Wa from a feed-in section onto an alignment table 13a on an alignment stand in a locating section which is provided separately from an exposing section, and subjecting the work Wa to an automatic alignment operation and a step of fixing the alignment table 13a mounting the work Wa thereon to a traverser 1 which is fixed with a photomask 8 and is displaced from the exposing section 30 to the locating section 40 by vacuum suction and checking the automatic alignment thereof, the work locating method further includes a step of displacing a forklifter 22 disposed in the exposing section to the locating section 40 to deliver an alignment table 13b mounted thereon onto an alignment stand 16 during an exposure process and allowing the forklifter to return to an original position in the exposing section 30 before the exposure process is completed, thereby performing the work locating operation with high alignment accuracy between the work and the photomask and high producibility in the automatic exposure process.

REFERENCES:
patent: 3902615 (1975-09-01), Levy et al.
patent: 3937579 (1976-02-01), Schmidt
patent: 4787800 (1988-11-01), Sone et al.
patent: 4996763 (1991-03-01), Sano et al.
patent: 5120134 (1992-06-01), Kosugi
patent: 5182615 (1993-01-01), Kurdsawa et al.
Patent Abstracts Of Japan, vol. 5, No. 110; 17 Jul. 1981; Publication No. JP 56-051732 (Chiyou LSI Gijutsu Kenkyu Kumiai).
Patent Abstracts Of Japan, vol. 7, No. 27: 3 Feb. 1983; publication No. 57.183031 (Tokto Shibaura Denki).
IBM Technical Disclosure Bulletin, vol. 30, No. 12; May 1988; pp. 209-210; "Remote Location Optical Registration System".

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