Method of judging residual film by optical measurement

Details Method of judging residual film by optical measurement Method of judging residual film by optical measurement

2006-01-10

2006-01-10

Coleman, W. David (Department: 2891)

Semiconductor device manufacturing: process

With measuring or testing

C438S015000, C438S016000, C438S017000, C438S687000, C356S389000, C356S389000

Reexamination Certificate

active

06984532

ABSTRACT:
A method of judging a residual film on a sample by an optical measurement, the sample including a first metal film whose reflectance is changed depending on a wavelength of measuring light, and an insulating film formed above the first metal film, and the residual film being a second metal film above the insulating film, the method comprising irradiating the sample with a measuring light so as to measure a change in intensity of light reflected from the sample depending on the wavelength of the measuring light, thereby obtaining a reflectance spectrum curve, and dividing the reflectance spectrum curve into a plurality of wavelength regions so as to judge presence or absence of the second metal film above the insulating film depending on a waveform in each of the wavelength regions of the reflectance spectrum curve.

REFERENCES:
patent: 5166080 (1992-11-01), Schietinger et al.
patent: 5499733 (1996-03-01), Litvak
patent: 6204922 (2001-03-01), Chalmers
patent: 6306669 (2001-10-01), Yano et al.
patent: 6309555 (2001-10-01), Chen
patent: 6658144 (2003-12-01), Hatab
patent: 6750143 (2004-06-01), Iijima et al.
patent: 6753249 (2004-06-01), Chen et al.
patent: 2001/0039064 (2001-11-01), Ushio et al.
patent: 2003/0207476 (2003-11-01), Eriguchi et al.
patent: 11-325840 (1999-11-01), None

Affiliated with

Also associated with

Rating

Method of judging residual film by optical measurement does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of judging residual film by optical measurement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of judging residual film by optical measurement will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3581964