Method of integrating MOS devices of double and single gate stru

Metal working – Method of mechanical manufacture – Assembling or joining

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29576B, 148 15, 148187, 357 23, 357 91, G11C 1140, B01J 1700, H01L 2927

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044956932

ABSTRACT:
A nonvolatile semiconductor memory device is provided having a MOS transistor and a floating gate type MOS transistor. The length of an overlap between a floating gate and a drain region of the floating gate type MOS transistor is made smaller than that of an overlap between the gate and the drain region of the MOS transistor.

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