Method of integrated circuit fabrication including a step of dep

Fishing – trapping – and vermin destroying

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437192, 437195, 437228, H01L 21283

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active

056935617

ABSTRACT:
Integrated circuit fabrication includes the formation of tungsten contacts in windows. Between the tungsten and the contact region are Ti and TiN layers. Defects are prevented or reduced by sealing grain boundaries in the TiN layer prior to tungsten deposition. Grain boundaries are sealed by rinsing the TiN layer in water at ambient temperature or above.

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"Failure of Titanium Nitride Diffusion Barriers During Tungsten Chemical Vapor Deposition: Theory and Practice", Matthew Rutten et al., Conference Proceedings ULSI-VII, 1992 Materials Research Society.

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