Method of inspecting substrate processing apparatus, and...

Details Method of inspecting substrate processing apparatus, and... Method of inspecting substrate processing apparatus, and...

2007-03-13

2007-03-13

Barlow, John (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Quality evaluation

C438S014000

Reexamination Certificate

active

11329078

ABSTRACT:
A method of inspecting a substrate processing apparatus that enables a reduction in operator labor time to be achieved. A host computer instructs a substrate processing apparatus to prohibit transfer of a product wafer into the substrate processing apparatus during a period of cleaning the substrate processing apparatus. The substrate processing apparatus notifies the host computer of a number and types of inspection wafers to be used in inspections for predetermined inspection items. The host computer notifies the substrate processing apparatus that preparation of the inspection wafers has been completed.

REFERENCES:
patent: 6954716 (2005-10-01), Tanaka et al.
patent: 2003/0182084 (2003-09-01), Tanaka et al.
patent: 2006/0181699 (2006-08-01), Numakura
patent: 2002-25878 (2002-01-01), None

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