Method of inspecting photo-mask

Details Method of inspecting photo-mask Method of inspecting photo-mask

2007-10-30

2007-10-30

Desire, Gregory M (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C156S064000, C156S152000, C250S307000, C250S492200, C382S145000, C382S149000, C430S005000

Reexamination Certificate

active

10411610

ABSTRACT:
Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask comprises performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product.

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patent: 2003/0194618 (2003-10-01), Hoga et al.

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