Method of inspecting monocular diplopia and eye mark pattern...

Details Method of inspecting monocular diplopia and eye mark pattern... Method of inspecting monocular diplopia and eye mark pattern...

2006-01-23

2008-08-05

Mack, Ricky L. (Department: 2873)

Optics: eye examining, vision testing and correcting

Eye examining or testing instrument

Subjective type

C351S240000, C351S241000

Reexamination Certificate

active

07407290

ABSTRACT:
In order to examine a degree of monocular diplopia is easily examined in a quantitative manner, a plurality of circular eye marks are seen from a predetermined examination distance with a single eye of a patient to find a particular eye mark whose double vision images are observed to be circumscribed each other, and a degree of monocular diplopia is determined by a view angle of the relevant circular eye mark. Since the eye mark is formed as a circular pattern, a degree of monocular diplopia can be examined irrespective of an axial direction along which double vision images appear.

REFERENCES:
patent: 4222639 (1980-09-01), Sheedy
patent: 2002/0176051 (2002-11-01), Saladin

Affiliated with

Also associated with

Rating

Method of inspecting monocular diplopia and eye mark pattern... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of inspecting monocular diplopia and eye mark pattern..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of inspecting monocular diplopia and eye mark pattern... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4019872