Method of inspecting masks and apparatus thereof

Radiant energy – Invisible radiant energy responsive electric signalling – With means to inspect passive solid objects

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2504922, G01F 2300, H01J 3730

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active

047483270

ABSTRACT:
A method of inspecting masks which have lithographic patterns thereon, comprises the steps of depositing an electron-emissive layer on the patterned first major surface of the mask, the electron-emissive layer on the clear area of the patterned surface emitting electron beams when irradiated with energy beams, applying energy beams to the patterned surface from behind through the second major surface of the mask, guiding the electron beams emitted from the electron-emissive layer to an electron optical system, thereby forming an electron beam image of the pattern on a detector means, and comparing detection signals corresponding to the pattern and output by the detector means with reference signals representing the design shape and size of the pattern, thereby to inspect the mask.

REFERENCES:
patent: 4572956 (1986-02-01), Tojo et al.
patent: 4608332 (1986-08-01), Ward
IEEE Transactions on Electron Devices, vol. ED-22, No. 7, 7th Jul. 1975, pp. 409-413, New York, U.S.; J. P. Scott: "An Electron Image Projector with Automatic Alignment".
Proc. of SPIE vol. 334, p. 208, "Reticle Inspection Technology to Compare the Pattern Against Data", D. Awamura, 1982.
Proc. of SPIE vol. 334, p. 216, "Automatic Mask and Reticle Inspection System", H. Yang, 1982.
"Television by Electron Image Scanning", by Philo Taylor Farnsworth; pp. 411-444.

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