Method of inspecting and retouching a photo mask

Details Method of inspecting and retouching a photo mask Method of inspecting and retouching a photo mask

1978-07-18

1981-03-17

Hoffman, James R.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

427 9, 427 35, 427140, B05D 306

Patent

active

042567785

ABSTRACT:
A method of treating a photo mask comprising preparing the photo mask which has a conductive transparent substance on a major surface of an insulating substrate and which is formed with a mask pattern of an opaque substance on the conductive transparent substance, and irradiating the mask with an electron beam to inspect and/or retouch said mask.

REFERENCES:
patent: 3162767 (1964-12-01), DiCurcio et al.
patent: 3748975 (1973-07-01), Tarabocchia
patent: 4109029 (1978-08-01), Ozdemir et al.
Hawkes et al., The Preparation of Microcircuit Stencils and Patterns by Photomechanics and Electron Beam Machining, Microbionics and Reliability, vol. 4, pp. 65-79, 1965.
Bruning et al., An Automated Mask Inspection System-AMIS IEEE Trans. on Electron Devices, vol. ED-22, No. 7, Jul. 1975, pp. 487-495.

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