Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-05-22
2007-05-22
Chawan, Sheela (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S145000, C430S005000, C430S030000, C356S237500
Reexamination Certificate
active
10611067
ABSTRACT:
A method of inspecting a mask or reticle, the mask or reticle being provided with a pattern to be transferred onto a semiconductor wafer, the pattern having a defect, includes the step of creating a plurality of logical zones and uniquely associating each of said logical zones with a surface area of said pattern. Then, an inspection rule representing a characteristic sensitivity for detecting a defect is associated with each of said logical zones. An image of said pattern is then recorded and compared with a reference image of an ideal pattern for locating a defect within said pattern. One of said logical zones is then identified with said located defect and that inspection rule which is associated with said identified logical zone is retrieved from a memory. The inspection rule is then applied to a characteristic of said defect for determining, whether said defect is to be repaired. A signal can be issued in response to said determination.
REFERENCES:
patent: 4559603 (1985-12-01), Yoshikawa
patent: 4641353 (1987-02-01), Kobayashi
patent: 5046109 (1991-09-01), Fujimori et al.
patent: 5790251 (1998-08-01), Hagiwara
patent: 5838433 (1998-11-01), Hagiwara
patent: 5965306 (1999-10-01), Mansfield et al.
patent: 6190836 (2001-02-01), Grenon et al.
patent: 6198529 (2001-03-01), Clark et al.
patent: 6222936 (2001-04-01), Phan et al.
patent: 6297879 (2001-10-01), Yang et al.
patent: 6363296 (2002-03-01), Schulze
patent: 6466314 (2002-10-01), Lehman
patent: 6611953 (2003-08-01), Filseth et al.
patent: 6651197 (2003-11-01), Wildes et al.
patent: 6873720 (2005-03-01), Cai et al.
patent: 6925202 (2005-08-01), Karklin et al.
patent: 7079235 (2006-07-01), Lehman
Haffner Henning
Schulze Steffen
Chawan Sheela
Greenberg Laurence A.
Infineon - Technologies AG
Locher Ralph E.
Stemer Werner H.
LandOfFree
Method of inspecting a mask or reticle for detecting a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of inspecting a mask or reticle for detecting a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of inspecting a mask or reticle for detecting a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3750544