Method of inhibiting deposition of material on an internal wall

Details Method of inhibiting deposition of material on an internal wall Method of inhibiting deposition of material on an internal wall

1998-08-31

2000-12-19

King, Roy V.

Coating processes

Interior of hollow article coating

Metal base

427237, 427238, 427250, 42722531, 4272557, B05D 722, C23C 1600

Patent

active

061624993

ABSTRACT:
A method of inhibiting deposition of material on a wall of a chemical vapor deposition reactor includes providing a chemical vapor deposition reactor having a wall which has an inside facing surface, the inside facing surface at least partially defining a chemical vapor deposition reactor chamber; forming a first material atop the inside facing surface; positioning a substrate in the chemical vapor deposition a reactor chamber, the substrate having an outer surface; and chemical vapor depositing a second material layer on the substrate in a manner which is selective to the substrate outer surface, and not the first material, thereby restricting deposition of the second layer on the reactor inside facing surface.

REFERENCES:
patent: 4650698 (1987-03-01), Moriya et al.
patent: 5366585 (1994-11-01), Robertson et al.
patent: 5589233 (1996-12-01), Law et al.

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