Method of inducing transmission in optical lithography preforms

Details Method of inducing transmission in optical lithography preforms Method of inducing transmission in optical lithography preforms

2005-07-12

2005-07-12

Griffin, Steven P. (Department: 1731)

Glass manufacturing

Processes

Glass preform treating

C065S017400, C065S030100

Reexamination Certificate

active

06915665

ABSTRACT:
The invention provides an ultraviolet lithography method/system. The lithography method and system include providing a below 200 nm radiation source, providing a photolytically improved transmitting fused silica glass lithography optical element, transmitting below 200 nm photons through said photolytically improved transmitting fused silica glass lithography optical element to form a lithography pattern which is reduced and projected onto a radiation sensitive lithography printing medium to form a printed lithography pattern. Providing the photolytically improved transmitting fused silica glass lithography optical element includes providing a photolytically improved transmitting fused silica glass lithography optical element preform body and forming the photolytically improved transmitting fused silica glass lithography optical element preform into said lithography optical element.

REFERENCES:
patent: 3220814 (1965-11-01), Haven et al.
patent: 4625120 (1986-11-01), Caprari
patent: 4789389 (1988-12-01), Schermerhorn et al.
patent: 4857092 (1989-08-01), Meerman
patent: 4961767 (1990-10-01), Schermerhorn et al.
patent: 5086352 (1992-02-01), Yamagata et al.
patent: 5161059 (1992-11-01), Swanson et al.
patent: 5210816 (1993-05-01), Iino et al.
patent: 5325230 (1994-06-01), Yamagata et al.
patent: 5410428 (1995-04-01), Yamagata et al.
patent: 5547482 (1996-08-01), Chalk et al.
patent: 5597395 (1997-01-01), Bocko et al.
patent: 5616159 (1997-04-01), Araujo et al.
patent: 5668067 (1997-09-01), Araujo et al.
patent: 5773486 (1998-06-01), Chandross et al.
patent: 5983673 (1999-11-01), Urano et al.
patent: 6058739 (2000-05-01), Morton et al.
patent: 6205818 (2001-03-01), Seward, III
patent: 6263706 (2001-07-01), Deliso et al.
patent: 6266978 (2001-07-01), Oshima et al.
patent: 6319634 (2001-11-01), Berkey et al.
patent: 6333283 (2001-12-01), Urano et al.
patent: 6333284 (2001-12-01), Otsuka et al.
patent: 6410192 (2002-06-01), Priestly et al.
patent: 6466365 (2002-10-01), Maier et al.
patent: 6497118 (2002-12-01), Schermerhorn
patent: 6541168 (2003-04-01), Brown et al.
patent: 6544914 (2003-04-01), Kikugawa et al.
patent: 6550277 (2003-04-01), Uebbing et al.
patent: 6653024 (2003-11-01), Shiraishi et al.
patent: 6782716 (2004-08-01), Moore et al.
patent: 2002/0018942 (2002-02-01), Brown et al.
patent: 2002/0160276 (2002-10-01), Moore et al.
patent: 2003/0121283 (2003-07-01), Yu
patent: 2004/0091798 (2004-05-01), Moore et al.
patent: 0 483 752 (1992-05-01), None
patent: 0 636 586 (1995-02-01), None
patent: 0 972 753 (2000-01-01), None
patent: 0 985 643 (2004-03-01), None
patent: 60[1985]-90853 (1985-05-01), None
patent: 1-201664 (1989) (1989-08-01), None
patent: 05-152648 (1993-06-01), None
patent: 6-24997 (1994) (1994-04-01), None
patent: 6-48734 (1994) (1994-06-01), None
patent: 6[1994]-166522 (1994-06-01), None
patent: 6[1994]-166528 (1994-06-01), None
patent: 6-53593 (1994) (1994-07-01), None
Naouki Kitamura et al.,Refractive Index of Densified Silica Glass, Journal of Non-Crystalline Solids, NL, North Holland Physics Publishing, Amsterdam, vol. 159, No. 3, Jul. 1, 1993, pp. 421-245.
Shelby, JE,Radiation Effects In Hydrogen-Impregnated Vitreous Silica, Journal of Applied Physics, vol. 50, No. 5, May 1979, pp. 3702-3706.
D.R. Sempolinski, T.P. Seward, C. Smith, N. Borrelli, C. Rosplock, entitledEffects Of Glass Forming Conditions On The KrF-Excimer-Laser-Induced Optical Damage In Synthetic Fused Silica, Journal of Non-Crystalline Solids 203 (1996) pp. 69-77.
Primak et al., The Radiation Compaction of Vitreous Silica, J. Appl. Phys. 39, 5651-5658 (Nov. 1968).
Schermerhorn P., Excimer Laser Damage Testing of Optical Materials, SPIE, 1835:70-79, 1992.
EerNisse, E., Compaction of Ion Implanted Fused Silica, J. Appl. Phys., 45:167-174, Jan. 1994.
Ruller et al., The Effect of Gamma-Irradiationon the Density of Various Types of Silica, Journal of Non-Crystalline Solids, 136:163-172, 1991.
Rothschild et al., Effects of Excimer Laser Irradiationon the Transmission, Index of Refraction, and Density of Ultraviolet Grade Fused Silica, Appl. Phys. Lett. 55:1276-1278, Sep. 1989.
Primak, W., Section C, Ionization Compaction in the Compacted States of Viterous Silica, vol. 4 of Studies in Radiation Effects in Solids, edited by GJ. Dienes and LT. Chadderton (Gordon and Breach, 1975), 91-102.

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