Method of increasing index of refraction of silica glass

Details Method of increasing index of refraction of silica glass Method of increasing index of refraction of silica glass

1995-10-13

1997-04-01

Wong, Don

X-ray or gamma ray systems or devices

Specific application

Absorption

385123, G21K 500

Patent

active

056174608

ABSTRACT:
A method of increasing index of refraction of silica glass includes the step of irradiating a prescribed region of silica glass with X-ray having a wavelength within a range of from 1.2 .ANG. to 7.0 .ANG., and exciting K shell electrons of silicon atoms in the irradiated region with the X-ray, so that the index of refraction in the irradiated region is increased efficiently.

REFERENCES:
patent: 5084909 (1992-01-01), Pollak
Hoshakou (Synchrotron Radiation) vol. 7, No. 2 (1994) pp. 112-114.

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