Method of in-situ formation of a stable reference electrode for

Details Method of in-situ formation of a stable reference electrode for Method of in-situ formation of a stable reference electrode for

1992-11-10

1994-03-22

Niebling, John

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204412, 204434, 204435, 2041531, G01N 2726

Patent

active

052961249

ABSTRACT:
A method of forming a reference electrode having a continuously stable reference voltage and particularly well-suited for use in an in-tank electrochemical sensor. The method utilizes an inert substrate and a counter electrode, both immersed in electroplating fluid. Current is passed between the inert substrate and the counter electrode to strip and subsequently replate the inert substrate, which then serves as the reference electrode. The steps of stripping and replating the reference electrode are periodically repeated to maintain the stability of the reference electrode voltage.

REFERENCES:
patent: 2951978 (1957-05-01), Dickson et al.
patent: 4631116 (1986-12-01), Ludwig
Teach et al., Cyclic Pulse Voltammetric Stripping Analysis of Acid Copper Plating Baths, 1984, pp. 831-834.

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