Method of improving the pyrolytic deposition rate of copper oxid

Coating processes – Optical element produced – Transparent base

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427110, 4271262, 4271263, 427165, 427190, 427226, 427314, 427377, 427421, B05D 506

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active

052138429

ABSTRACT:
A pyrolitic deposition process, for pyrolitic deposition of organo-cupric powder to form copper oxide film, is improved. A substrate is heated, and organocupric powder is sprayed at the substrate, using oxygen gas as the carrier gas. Up to one-third greater deposition rate results, as compared to the process using compressed air as the carrier gas.

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