Method of improving photomask geometry

Details Method of improving photomask geometry Method of improving photomask geometry

2005-01-25

2005-01-25

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06846595

ABSTRACT:
Photomask manufacture is improved by adding assist bars320, 340for isolated features300. The bars320, 340are added at a center to center spacing that corresponds to the center to center spacing for densely packed features. By matching the assist bars to the densely packed features, the combined diffraction pattern of the isolated features is modified to more closely resemble the diffraction pattern of the densely packed features.

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