Method of improving adhesion resistance of silver halide photogr

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing

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430621, B03C 178

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active

043967094

ABSTRACT:
The adhesion resistance of a silver halide photographic light-sensitive medium comprising a support, at least one emulsion layer provided on one side of the support and a backing layer provided on the other side can be improved by incorporating an acid-treated gelatin and a gelatin hardener containing therein a vinyl sulfone group into the backing layer.

REFERENCES:
patent: 2993793 (1961-07-01), Beersmans et al.
patent: 4018609 (1977-04-01), Lohmer et al.
patent: 4021244 (1977-05-01), Nagatomo et al.
patent: 4146398 (1977-05-01), Arase et al.
patent: 4266010 (1981-05-01), Nagatomo et al.
patent: 4268627 (1981-05-01), Sera et al.

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