Method of implanting uniform concentrations in solids having pre

Metal working – Method of mechanical manufacture – Assembling or joining

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29571, 148 15, 148187, 148DIG83, 357 91, 427 35, H01L 21263

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046709681

ABSTRACT:
A method of manufacturing a semiconductor device involves the step of carrying out the implantation of an impurity in the main plane of a GaAs substrate for the simultaneous formation of a plurality of regions. When the angles formed with the perpendicular implantation of silicon ions in the GaAs main plane and the main orientations of GaAs substrate are expressed by the Euler angles (.lambda.,.mu.,.theta.), then the crystal orientation is so prescribed as to satisfy the following conditions:

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McLaughlin et al, Appl. Phys. Letts. 44 (1984) 252.
Blunt et al. in Ion-Implantation . . . Techniques ed, Ryssel et al, Springer-Verlag, Berlin, 1983, p. 443.
"Face Uniformity and Face Channeling in the Si Injection into GaAs", 13a-J-7 Preprint of Lectures in 1984 Autumn Applied-Physics Society, Yasuhiro Kawasaki et al, (Atsugi-Tsu-Ken).

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