Method of identifying a semiconductor wafer utilizing a light so

Details Method of identifying a semiconductor wafer utilizing a light so Method of identifying a semiconductor wafer utilizing a light so

1988-10-06

1990-01-23

Fields, Carolyn E.

Radiant energy

Coded record and readers; invisible radiant energy type

2503381, G06K 710

Patent

active

048960349

ABSTRACT:
Automatic identification of each semiconductor wafer during wafer processing is achieved by the invention regardless of layers deposited on a code pattern. The code pattern, preferably, a bar code pattern, is formed on a front surface of the semiconductor wafer, and a light beam including infrared rays is irradiated onto a bottom surface thereof. The infrared rays easily penetrate through the silicon wafer and reflect from the bar code pattern formed on the front surface of the wafer. The reflected beam of infrared rays is received by a detector disposed on a back side of the wafer, and each wafer is identified by decoding the received signal. The bar code pattern can be directly formed by inscribing the wafer surface by a laser beam or inscribing a metal layer deposited thereon.

REFERENCES:
patent: 4368979 (1983-01-01), Ruell
patent: 4825093 (1987-04-01), Kiriseko et al.

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