Method of hologram exposure, mask for hologram exposure,...

Details Method of hologram exposure, mask for hologram exposure,... Method of hologram exposure, mask for hologram exposure,...

2006-05-16

2006-05-16

Boutsikaris, Leonidas (Department: 2872)

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

C430S001000, C430S022000, C356S401000

Reexamination Certificate

active

07046408

ABSTRACT:
Exemplary embodiments of the present invention provide a method of hologram exposure that is capable of making accurate alignment. A method of exposure according to one exemplary aspect of the present invention includes providing a mask for hologram exposure M2including first alignment marks A1through A4that is readable with an alignment optical system40and a hologram exposure area D2to which a hologram is recorded by hologram exposure so as to form a desirable coherent pattern and second alignment marks AL1through AL4on a substrate10. Exemplary aspects of the invention also include performing test hologram exposure with the mask for hologram exposure aligned to the substrate based on the first alignment marks, calculating the amount of gaps (ΔX,ΔY, Δθ) between the first alignment marks and the hologram exposure area based on the second alignment marks formed on the substrate and the amount of correction (−ΔXc, −ΔYc, −Δθ) based on the gaps, and performing hologram exposure with the mask for hologram exposure aligned to the substrate based on the amount of correction and the first alignment mark.

REFERENCES:
patent: 5504596 (1996-04-01), Goto et al.
patent: 6329104 (2001-12-01), Clube et al.
patent: 02-005510 (1990-01-01), None
patent: 03-139651 (1991-06-01), None
patent: 04-229890 (1992-08-01), None
patent: 06-308872 (1994-11-01), None
Francis Clube et al.; “P-40: 0.58μm Enabling Lithography for Low-Temperature Polysilicon Displays”; SID 03 Digest; pp. 350-353.

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