Coating apparatus – Gas or vapor deposition – Work support
Patent
1998-03-31
1999-05-25
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Work support
118724, 118500, 279128, 361234, 156345, C23C 1600, H05H 100
Patent
active
059066849
ABSTRACT:
In a method of holding a substrate and a substrate holding system where, the amount of foreign substances on the back surface of the substrate can be decreased and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exposed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.
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Ito Youichi
Ogawa Yoshifumi
Shichida Hiroyuki
Takahashi Kazue
Tamura Naoyuki
Breneman R. Bruce
Hitachi , Ltd.
Lund J.
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