Radiation imagery chemistry: process – composition – or product th – Effecting frontal radiation modification during exposure,... – Involving motion during exposure – e.g. – dodging – etc.
Patent
1999-08-31
2000-08-22
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Effecting frontal radiation modification during exposure,...
Involving motion during exposure, e.g., dodging, etc.
430 30, 430942, 430945, G03F 900
Patent
active
061070114
ABSTRACT:
A method of high resolution imaging for integrated circuits employs two masks and a laser source to impart an image onto a thermoresist coated image receiving surface. A primary mask carries a principal image to be recorded and a secondary mask contains an array of lenslets. The lenslet array concentrates light from a pulsed laser source onto a plurality of exposure points on the primary mask and the image features contained within that plurality of exposure points are imagewise reproduced in a corresponding plurality of exposure points on the image receiving surface. The lenslets in the lenslet array are dimensioned and positioned such that the plurality of exposure points formed on the image receiving surface have sufficient separation to avoid interaction. Relative motion ("scanning") between the primary and secondary mask creates raster lines on the primary mask to be exposed onto corresponding raster lines on the image receiving surface. Scanning continues until the entire image is transferred to the image receiving surface.
REFERENCES:
patent: 5739898 (1998-04-01), Ozawa et al.
patent: 5847812 (1998-12-01), Ooki et al.
patent: 5851707 (1998-12-01), Shibuya et al.
Ooki et al: "Exeperimental Study on Non-Linear Multiple Exposure Method" SPIE vol. 3051 pp. 85-93, 1997.
Creo SRL
Young Christopher G.
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