Method of heating a substrate with multiple selectively deactuat

Details Method of heating a substrate with multiple selectively deactuat Method of heating a substrate with multiple selectively deactuat

1999-03-22

2000-04-04

Walberg, Teresa

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219405, 219411, 118724, 118725, F27B 514

Patent

active

060464356

ABSTRACT:
A substrate heating apparatus having a housing forming a substrate receiving chamber and a heater located inside the chamber. The heater has a thin film flat ribbon heater element sandwiched between two glass-ceramic panels.

REFERENCES:
patent: 3883719 (1975-05-01), Hurko
patent: 4150280 (1979-04-01), Hurko
patent: 4481406 (1984-11-01), Muka
patent: 4518848 (1985-05-01), Weber
patent: 4715921 (1987-12-01), Maher et al.
patent: 4789771 (1988-12-01), Robinson et al.
patent: 4903754 (1990-02-01), Hirscher et al.
patent: 4919614 (1990-04-01), Kitagawa et al.
patent: 4979464 (1990-12-01), Kunze-Concewitz
patent: 5059770 (1991-10-01), Mahawili
patent: 5157240 (1992-10-01), Chow
patent: 5411076 (1995-05-01), Matsunaga et al.
patent: 5462603 (1995-10-01), Murakami
patent: 5484011 (1996-01-01), Tempman et al.
patent: 5536918 (1996-07-01), Ohkase et al.
patent: 5588827 (1996-12-01), Muka
patent: 5641421 (1997-06-01), Manov et al.
patent: 5688331 (1997-11-01), Aruga et al.
patent: 5693244 (1997-12-01), Pragt et al.
patent: 5710407 (1998-01-01), Moore et al.
patent: 5766363 (1998-06-01), Mizuno et al.
patent: 5804791 (1998-09-01), Gelus

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