Method of growing pyrolytic silicon dioxide layers

Details Method of growing pyrolytic silicon dioxide layers Method of growing pyrolytic silicon dioxide layers

1975-09-22

1977-07-05

Gwinnell, Harry J.

Coating processes

Coating by vapor, gas, or smoke

427 95, C23C 1100

Patent

active

040341305

ABSTRACT:
The method of producing pyrolytic SiO.sub.2 on the surface of a substrate comprises mixing SiH.sub.4 and NOCl in an atmosphere of carrier gas, and passing the gas mixture over the heated substrate. With this process, precipitation of SiO.sub.2 on the walls of the reaction chamber is avoided.

REFERENCES:
patent: 3243314 (1966-03-01), Lehamn et al.
patent: 3607378 (1971-09-01), Ruggiero
patent: 3681132 (1972-08-01), Pammer et al.
Aylett et al., Chem. Abs. vol. 79, No. 121416e (1973).
Beattie, Chem. Abs. vol. 51, No. 7213g (1957).

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