Method of growing compound semiconductor thin film using multich

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148DIG3, 148DIG25, 148DIG48, 148DIG169, 156610, 437 82, 437107, 437108, 437963, H01L 21203, H01L 21324

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049607200

ABSTRACT:
In molecular beam epitaxial growth of GaAs substrate, a compound semiconductor thin film having Ga and As is grown by Ga beam and As beam in MBE chamber and then the substrate is transferred to an annealing chamber where the substrate is annealed under As vapor pressure. The above process is repeated to a predetermined layer level whereby it eliminates divergence from stoichiometric.

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