Method of gettering unintentional mobile impurities in silicon w

Fishing – trapping – and vermin destroying

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437 10, 437 12, 437975, 148DIG60, 148DIG61, H01L 21306

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active

051302608

ABSTRACT:
A method of gettering unintentional mobile impurities starts with production of an damaged portion on the reverse side of a silicon wafer, and the silicon wafer is placed in a high temperature vacuum ambience so that the unintentional mobile impurities are firstly trapped by the damaged portion and, then, evacuated to the high temperature vacuum ambience.

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patent: 4561171 (1985-12-01), Schlosser
patent: 4608096 (1986-08-01), Hill
patent: 4645546 (1987-02-01), Matsushita
patent: 4661166 (1987-04-01), Hirao
patent: 4782029 (1988-11-01), Takemura et al.

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