Method of generating mask distortion data, exposure method...

Details Method of generating mask distortion data, exposure method... Method of generating mask distortion data, exposure method...

2007-02-13

2007-02-13

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C430S296000, C430S942000, C382S144000, C716S030000

Reexamination Certificate

active

10848918

ABSTRACT:
A method of generating mask distortion data capable of improving accuracy of distortion measurement, an exposure method using the same and a method of producing a semiconductor device, wherein a production mask is produced by a first thin film formed with a predetermined pattern, and a positional accuracy measurement mask is produced by forming second positional accuracy measurement marks at substantially same positions as those of the first positional accuracy measurement marks on a mask blanks having a second thin film, positions of the second positional accuracy measurement marks and third positional accuracy measurement marks of the positional accuracy measurement mask are measured, a correlation function of the both are calculated, positions of the first positional accuracy measurement marks of the production mask are measured, and mask distortion data on the first thin film of the production mask is generated by using the correlation function.

REFERENCES:
patent: 6040095 (2000-03-01), Enichen et al.
patent: 6171736 (2001-01-01), Hirayanagi
patent: 2002/0098423 (2002-07-01), Koba

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