Method of fracturing a subterranean formation

Wells – Processes – Distinct – separate injection and producing wells

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166280, 166308, E21B 4326

Patent

active

040786099

ABSTRACT:
A fracturing method wherein (a) a viscous, prop free fluid is injected into a new or preexisting fracture to widen and extend the fracture, (b) a viscous prop carrying fluid is injected in one or more stages, (c) a viscous prop free spacer is injected, (d) a low viscosity inefficient penetrating fluid is injected, all of the foregoing being injected at rates and pressures calculated to prevent said fracture from healing, (e) injection of fluids at rates and pressures calculated to prevent said fracture from healing is ceased (including the embodiments of injecting a low viscosity penetrating fluid at a matrix rate, ceasing injection entirely, flowing back the well, or a combination thereof), and thereafter at least steps (a) and (b) are repeated.

REFERENCES:
patent: 3058909 (1962-10-01), Kern
patent: 3151678 (1964-10-01), Hanson et al.
patent: 3245470 (1966-04-01), Henry
patent: 3335797 (1967-08-01), Braunlich, Jr.
patent: 3592266 (1971-07-01), Tinsley
patent: 3642068 (1972-02-01), Fitch et al.
patent: 3710865 (1973-01-01), Kiel
patent: 3850247 (1974-11-01), Tinsley
patent: 3933205 (1976-01-01), Kiel
patent: 3948325 (1976-04-01), Winston et al.
patent: 3974077 (1976-08-01), Free

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