Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal
Reexamination Certificate
2006-01-10
2006-01-10
Nguyen, Ha Tran (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Reexamination Certificate
active
06984537
ABSTRACT:
A two-transistor pixel of an imager has a reset region formed adjacent a charge collection region of a photodiode and in electrical communication with a gate of a source follower transistor. The reset region is connected to one terminal of a capacitor which integrates collected charge of the photodiode. The charge collection region is reset by pulsing the other terminal of the capacitor from a higher to a lower voltage.
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“A 5.5μm CMOS Image Sensor Cell Utilizing A Buried Reset Channel” by Mabuchi et al., 1997 Symposium on VLS Technology Digest of Technical Papers, pp. 75-76.
Dickstein , Shapiro, Morin & Oshinsky, LLP
Geyer Scott B.
Nguyen Ha Tran
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