Method of forming thin vapor deposited film of organic material

Details Method of forming thin vapor deposited film of organic material Method of forming thin vapor deposited film of organic material

1983-09-16

1985-09-24

Childs, S. L.

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427 35, 427 38, 427 39, 427 50, 427 541, 4272555, 4272556, 4272557, C23C 1100, C23C 1300

Patent

active

045432759

ABSTRACT:
A process for forming a vapor-deposited thin layer of organic material is disclosed. The process involves placing organic material on a support base within a vacuum chamber and providing a heat source in the vicinity of the organic material. A second support base is then provided within the vacuum chamber and heat is applied to the organic material at a temperature which causes the organic material to form vapors. The vapors are vapor-deposited on the second support base forming the thin layer of organic material. It is generally desirable to move both of the support bases during the vapor deposition process allowing the formation of a continuous uniform thin layer of organic material.

REFERENCES:
patent: 3296011 (1967-01-01), McBride et al.
patent: 3362848 (1968-01-01), Hamilton
patent: 3379803 (1968-04-01), Tittmann et al.
patent: 3547683 (1970-12-01), Williams et al.
patent: 4325986 (1982-04-01), Baron et al.

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