Coating processes – Direct application of electrical – magnetic – wave – or... – Electromagnetic or particulate radiation utilized
Reexamination Certificate
2011-08-16
2011-08-16
Chen, Bret (Department: 1715)
Coating processes
Direct application of electrical, magnetic, wave, or...
Electromagnetic or particulate radiation utilized
C427S597000, C427S165000, C427S166000, C427S294000, C427S376200
Reexamination Certificate
active
07998539
ABSTRACT:
A method of forming thin-film structure by oblique-angle deposition is provided. The method includes the steps of: evaporating target source in a chamber by an electron beam evaporation system, and introducing process gas into the chamber and adjusting tilt angle of the evaporation substrate and controlling temperature in the chamber during evaporation to form thin-film on a evaporation substrate by oblique-angle deposition, and then annealing the evaporation substrate to form a thin-film having porous nanorod microstructure.
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Chang Chia-Hua
Chiu Ching-Hua
Kuo Hao-Chung
Yang Chin-Sheng
Yu Pei-Chen
Chen Bret
National Chiao Tung University
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