Method of forming T-shaped, cross-sectional pattern using two la

Details Method of forming T-shaped, cross-sectional pattern using two la Method of forming T-shaped, cross-sectional pattern using two la

1994-11-29

1996-12-10

Fourson, George

Fishing, trapping, and vermin destroying

437 39, 437 41, 437187, 437203, 437228, 437229, 437912, 437944, 148DIG100, 430296, 430312, 430407, H01L 21265

Patent

active

055830633

ABSTRACT:
A method of forming a T-shaped, cross-sectional pattern that enables upper and lower parts of the T-shaped patten using in first and second resist films layers independent of an existence of a mixing layer. A first resist film that is not sensitive to UV light is formed on or over a substrate and a first window is formed on or over a substrate and a first window is formed in the first resist film. The first window corresponds to the lower part of the T-shaped pattern. Next, a second resist film is formed on the first resist film to cover the first window. The second resist film is exposed to UV light to form a given image in the second resist film and is developed to form a second window in the second resist film. The second window corresponds to the upper part of the pattern.

REFERENCES:
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patent: 5288660 (1994-02-01), Hua et al.
patent: 5304511 (1994-04-01), Sakai
patent: 5445979 (1995-08-01), Hirano

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