Method of forming stitched patterns in combination in a sewing m

Sewing – Elements – Frames

Patent

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Details

112454, 112456, 112458, D05B 302

Patent

active

046640479

ABSTRACT:
If a predetermined pattern to be stitched exceeds a maximum amplitude amount available in a sewing machine, such a pattern is divided into appropriate shapes, and the divided shapes are stored in an electronic memory as pattern forming elements to be sized within the maximum amplitude amount. The pattern forming elements are classified into a first pattern group which is symmetrical with respect to a central basic line, a second pattern group which is formed at a left or right side of the central basic line, and a third pattern group which is asymmetrical with respect to the central basic line. The pattern forming elements are used in common to some of other predetermined patterns, and when those are selectively combined, the predetermined pattern may be produced into a stitched pattern.

REFERENCES:
patent: 4499838 (1985-02-01), Voza
patent: 4522137 (1985-06-01), Takenoya et al.
patent: 4572095 (1986-02-01), Makabe et al.

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