Method of forming stable images in electron beam writable glass

Details Method of forming stable images in electron beam writable glass Method of forming stable images in electron beam writable glass

1989-06-23

1992-09-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 13, 430 14, 430 19, 430270, 430296, 430321, 428410, 428426, 65 3011, G03G 500, G11B 700

Patent

active

051457571

ABSTRACT:
A silicate glass article comprising an amount of SiO.sub.2 effective as a network former and,

REFERENCES:
patent: 4132538 (1979-01-01), Eolin et al.
patent: 4160654 (1979-07-01), Bartholomew et al.
patent: 4296479 (1981-10-01), Wu
patent: 4894303 (1990-01-01), Wu

Affiliated with

Also associated with

Rating

Method of forming stable images in electron beam writable glass does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming stable images in electron beam writable glass , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming stable images in electron beam writable glass will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-133523