Method of forming silicon dioxide

Details Method of forming silicon dioxide Method of forming silicon dioxide

1975-04-14

1977-01-11

Rutledge, L. Dewayne

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

65 3A, 148174, 427 93, 350 96WG, H01L 2118

Patent

active

040025128

ABSTRACT:
A method of depositing a layer comprising SiO.sub.2 on a surface of a substrate at a rate which is temperature independent is disclosed. The method includes combining dichlorosilane (SiH.sub.2 Cl.sub.2) with an oxidizing gas, such as O.sub.2, CO.sub.2, N.sub.2 O, H.sub.2 O, to form SiO.sub.2.

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