Method of forming Si-O containing coatings

Coating processes – Heat decomposition of applied coating or base material – Coating decomposed to form carbide or coating carbonized

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427377, 427387, 4273977, 427579, 428688, 437238, B05D 302

Patent

active

054417651

ABSTRACT:
Disclosed is a method for forming improved Si--0 containing coatings on electronic substrate. The method comprises treating Si--0 containing ceramic coatings derived from hydrogen silsesquioxane resin with hydrogen gas. The resultant coatings have improved properties such as stable dielectric constants.

REFERENCES:
patent: 4756977 (1988-07-01), Haluska et al.
patent: 5320868 (1994-06-01), Ballance et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of forming Si-O containing coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming Si-O containing coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming Si-O containing coatings will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2180447

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.